摘要本文采用磁控溅射法制备得到CuO薄膜、CuO/Al（2个周期）和CuO/Al（8个周期）复合薄膜。利用Nd:YAG脉冲激光器输出的激光烧蚀薄膜材料，得到薄膜材料的等离子体，通过采集等离子体发射光谱对激光致等离子体特性进行研究。采用Boltzmann图谱法计算等离子体的电子温度，采用Stark展宽法计算等离子体的电子密度。分析等离子体电子温度与电子密度的影响因素，发现在一定条件下，等离子体电子温度和电子密度会随着激光能量的增大而增大，等离子体电子密度随延迟时间的增加而减小。另外，薄膜材料与薄膜结构对等离子体电子温度和电子密度也有重要影响。64343

毕业论文关键词  磁控溅射  发射光谱  电子温度  电子密度

毕业设计说明书（论文）外文摘要

Title The measurements of plasma temperature and density generated by laser ablated film                                       

Abstract In this paper, CuO film, CuO/Al (two cycles), and CuO/Al (eight cycles) composite film were prepared by vacuum magnetron sputtering. Optical emission spectroscopic studies have been carried out on a film plasma generated using Nd:YAG pulse laser . The electron temperature and electron density were calculated by analyzing spectral data. The temperature measurements have been performed by Boltzmann diagram method, while density measurements were made using the Stark broadening method. The changes of them showed that, under certain conditions, the plasma electron temperature and electron density increase with the growth of the laser energy, and the electron density increases with the delay time decreases, Meanwhile, the film materials and film structure also have an important influence on them.

Keywords   Magnetron sputtering   Optical emission spectroscopic   Electron temperature   Electron density

目   录

1  前言 1

1.1 课题研究背景及意义 1

1.2 相关领域研究进展 1

1.3 本文主要工作 2

2  薄膜材料的制备 4

2.1 实验设备 4

2.1.1真空镀膜设备 4

2.1.2磁控溅射原理 5

2.1.3基片清洗设备 6

2.2实验材料 6

2.3激光烧蚀薄膜材料制备过程 7

2.3.1基片清洗 7

2.3.2基座制作 7

2.3.3真空镀膜 7

2.4薄膜参数 8

3  激光烧蚀薄膜材料的等离子体发射光谱研究 10

3.1 实验原理、装置与方法 10

3.1.1实验原理 10

3.1.2 实验装置 10

3.1.3实验方法 12

3.2 结果与分析 14

3.2.1薄膜材料和薄膜结构对发射光谱的影响 14

3.2.2激光能量和延迟时间对发射光谱的影响 15

4  等离子体电子温度和电子密度的计算 20

4.1 等离子体电子温度的计算 激光烧蚀薄膜材料等离子体的电子温度与电子密度测量:http://www.751com.cn/huaxue/lunwen_71461.html