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MgZnO薄膜制备及其光电探测器研究

时间:2018-04-22 20:08来源:毕业论文
实现 MgZnO薄膜的禁带宽度在一定范围内连续可调,从而制备得到广泛适用于蓝光至紫外光谱区域的发光器件,使得其运用越来越广泛。本实验采用了射频磁控溅射法通过改变溅射功率和

摘要MgZnO 半导体薄膜作为一种原料来源广泛,价格低廉,无毒无害的新型光电材料,通过实现禁带宽度的连续可调,使其作为一种宽带隙材料受到了大家的关注。人们通过改变 Mg 的含量、溅射功率等一系列因素来实现 MgZnO薄膜的禁带宽度在一定范围内连续可调,从而制备得到广泛适用于蓝光至紫外光谱区域的发光器件,使得其运用越来越广泛。本实验采用了射频磁控溅射法通过改变溅射功率和氩氧比成功的在硅片和玻璃衬底上沉积了非晶MgZnO薄膜,并通过XRD、SEM、PL和透过率的检测手段对薄膜的结构和光学特性进行了分析。非晶 MgZnO薄膜表面平整光滑,结晶性差,在不同溅射功率作用下的峰位变化很小,为近紫外发光,氩氧比的改变使得Mg没有与衬底很好的结合,薄膜在可见光范围内具有很高的透过率,溅射功率的变化使得其带隙逐渐往紫外区变化。  21599
关键词  非晶MgZnO 薄膜  结构性能   光学性能
Title    Preparation and Photodetector research of  MgZnO films                                             
 Abstract
MgZnO  semiconductor films have  absorbed much  attention as a  kind of  new
photovoltaic materials for wide band  gap, broad sources of raw
materials, low price and nontoxic by implementing adjustable band gap
continuously. The band gap of  MgZnO films  has been achieved  adjustable
continuously within a certain range by varying the content of Mg,the
sputtering power and other factors. As a result,the light-emitting
device  has been prepared  which was  widely used in Blu-ray to ultraviolet
spectrum region to make its use more widely.  By controlling sputtering
power and argon oxygen ratio, RF magnetron sputtering has been used to
deposit amorphous MgZnO thin film on silicon and glass substrates.  The
structure and optical properties of the films were analyzed through
detection means of XRD, SEM, PL and transmittance.  Experimental results
show that amorphous MgZnO films have smooth surface  and  poor
crystallinity. There is  little change in  position of the  peak at
different sputtering power and it is near ultraviolet light-emitting.
The change in the ratio of argon-oxygen can not make Mg have a good
combination with the substrate. The film has a high transmittance in
the visible range  and  the change of the sputtering power makes its band
gap gradually change to the ultraviolet region.
Keywords  amorphous MgZnO films  structural characteristics  optical properties
目录
 
1   引言 .  1
1.1  MgZnO薄膜的制备方法  1
1.2   磁控溅射中 MgZnO薄膜性能的影响因素.  3
1.3  MgZnO光电探测器存在的主要问题和发展趋势..  4
1.4  MgZnO薄膜的研究进展  4
1.5   本课题的研究内容   5
2  MgZnO薄膜的制备及流程  6
2.1   磁控溅射设备 ..  6
2.2   试验参数 .  7
2.3   样品制备流程及注意事项   7
2.4   样品的分析与表征方法 .  8
3   结果分析与讨论   10
3.1  MgZnO薄膜结构特性研究  10
3.2  MgZnO薄膜的光学特性分析..  19
结  论 .  23
致  谢 .  24
参考文献   25 MgZnO薄膜制备及其光电探测器研究:http://www.751com.cn/cailiao/lunwen_13867.html
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