摘要通过调整组元成分分配，改善工艺，相对于块体非晶来说，薄膜材料的制备更容易得到非晶结构。非晶薄膜的研究对大块非晶的研究工作具有借鉴意义，且有助于认清非晶合金的本质和晶化规律。26060
本文实验采用磁控溅射镀膜的原理先在玻璃基底上沉积CuZr薄膜，经探究后改用单晶硅进行实验，来系统研究组元成分、溅射气压和冷却时间对薄膜的非晶结构的影响，并且对用纳米压痕技术测定纳米薄膜的硬度和弹性模量进行了文献调研。
研究结果表明：在一定范围内，Cu含量越少，越容易形成非晶；溅射压强越低，越容易形成非晶；冷却时间越久，形成非晶效果越好。
关键词 非晶薄膜 磁控溅射 CuZr合金 纳米压痕
毕业论文设计说明书外文摘要
Title Cu-Zr amorphous thin films was prepared by magnetron sputtering and researched mechanics Performance
Abstract
By trying the element composition, improving experimental parameters,the film preparation is more easily to get an amorphous structure than the BMG. Learning preparation of amorphous films is meaningful for research on BMG research and useful to understand the nature of law and crystallization of amorphous alloys.
In this paper,Cu-Zr binary amorphous alloy thin films were prepared on Si substrates by magnetron sputtering technique. After explore we switched to the single crystal silicon to do experiment, by this way to study the influence of component composition , sputtering pressure and cooling time to film amorphous structure systematically, and do some literature survey of nanoindentation by measuring the hardness and elastic modulus.
The results show that : in a certain range, the less the Cu ratio is, the more easy to form an amorphous; the lower the pressure is, the more easy to form an amorphous; the longer cooling time, the better the results.
Keywords Amorphous films magnetron sputtering CuZr alloy nanoindentation
目 次
1 绪论 1
1.1 薄膜简介 1
1.2 非晶合金的研究 2
1.2.1 非晶合金的研究发展 2
1.2.2 非晶合金的形成 3
1.3 薄膜的物理制备方法 3
1.3.1 真空蒸镀法 3
1.3.2 溅射法 4
1.4 磁控溅射法制备薄膜 4
1.5 纳米压痕实验 6
1.5.1 纳米压痕设备 6
1.5.2 纳米压痕测量原理 7
1.5.3 纳米压痕测量结果的影响因素 7
1.5.4 蠕变性能 7
1.6 本次实验的意义及研究内容 8
2 实验设备与方法 9
2.1 本实验主要的实验设备 9
2.2 主要的分析仪器 10
2.3 其他的仪器设备 10
2.4 实验过程 11
3 探究薄膜的制备工艺 12
3.1 初步探究非晶合金薄膜的制备材料与方法 12
3.2 探究薄膜制备工艺对薄膜的影响 14
3.2.1 组元成分对薄膜的影响 14
3.2.2 溅射压强对薄膜的影响 17
3.2.3 冷却时间对薄膜的影响 18 磁控溅射制备CuZr非晶薄膜及其结构的研究:http://www.751com.cn/cailiao/lunwen_20102.html