摘要具有面内各向异性的软磁薄膜在集成电路元器件中得到广泛的应用。本文利用高真空磁控溅射平台制作了Co/FeMn、Ta/FeCo、FeCoDy等样品，通过VSM对磁滞回线进行了研究，对交换偏置效应进行验证。24539
通过研究，在实验中我们发现：
（1）对于Co/FeMn薄膜体系，其室温磁滞回线易轴方正、难轴倾斜，即具有较好的软磁性能；但易磁化轴没有发生偏移，即没有生成交换偏置。低气压可以增强离子溅射能量，有效地提高Co/FeMn体系的各向异性以及减小矫顽力。
（2）适当厚度的缓冲层Ta可以有效缓解衬底与薄膜之间的晶格失配与热失配，提高FeCo的薄膜质量，随着缓冲层厚度增加，矫顽力先增大后减小再增大，各向异性场先增加后减小。当镀Ta时间为5min时，FeCo薄膜的软磁性能最优，此时Hce=25 Oe，Hch=9 Oe，HK=38.5 Oe。
（3）通过调节Dy的含量可以有效控制FeCo薄膜的面内单轴各向异性和调整FeCo薄膜的矫顽力。FeCo的各向异性和矫顽力大小不随Dy含量单调变化，而是在某一处出现极大值。
关键词 面内各向异性 软磁 磁控溅射 缓冲层 稀土掺杂
毕业设计说明书（毕业论文）外文摘要
Title Preparation and characterization of soft magnetic thin films with in-plane anisotropy by magnetron sputtering
Abstract
A thin film with excellent in-plane anisotropy is widely used in integrated circuit components. In this paper, I have prepared a series of films of Co/FeMn, Ta/FeCo, and FeCoDy by using high vacuum magnetron sputtering system, studied the magnetic hysteresis loop by VSM, and verified the exchange bias effect.
During the process of experiment, several phenomena have been found :
(1) For Co/FeMn film system, the hysteresis loops at room temperature show good soft magnetic properties according to the regularity of their easy axes and incline of the hard axes; however there’s no shift on easy axis of magnetization which means there is no exchange bias. Low air pressure is able to enhance the energy of sputtering plasma, and is effective in improving the anisotropy of Co/FeMn system and reducing the coercivity.
(2) Appropriate thickness of Ta buffer layer can effectively relieve lattice mismatch and thermal mismatch between the substrate and the film, improving the quality of FeCo films. With the increase of the thickness of buffer layer, the coercivity decreases between two periods of increasing, while the anisotropy field increases first and then decreases. When the buffer layer plated for 5min, the soft magnetism of FeCo film behaves the optimal performance: Hce = 25 Oe, Hch = 9 Oe, HK = 38.5 Oe.
(3) By adjusting the content of Dy, the in-plane uniaxial anisotropy of FeCo films can be effectively controlled and the coercivity of FeCo films can be adjusted. The anisotropy and the size of coercivity of FeCo shows a great value in some one place rather than changing monotonically with the Dy content.
Keywords: In-plane anisotropy; Soft magnetic; Magnetron sputtering; Buffer layer
目 录
1 绪论 1
1.1 引文 1
1.2 软磁金属薄膜 1
1.2.1 单层金属薄膜 1
1.2.2 多层复合薄膜 2
1.3 非磁元素掺杂 2
1.4 软磁薄膜的重要参数 3
1.5 选题目的以及研究内容 5
2 实验材料的制备和研究方法 6
2.1 前期工作 6
2.2 实验样品的制备与设计 7
2.3 磁控溅射技术 9
2.3.1 磁控溅射原理 9
2.3.2 磁控溅射设备介绍 10
2.4 振动样品磁强计（VSM） 11 面内各向异性软磁薄膜的磁控溅射制备与表征:http://www.751com.cn/cailiao/lunwen_18077.html